The Beam Blanker Model 890 is used for Scanning Electron Microscope lithography. SEM lithography can be used for the fabrication of a wide variety of devices. Research areas include: quantum structures, optical structures, electro-mechanical structures, and for the testing of novel resists and ultra-small sensor fabrication.

Equipment Specifications:

• Input: TTL or 50 ohm termination selectable.
• Output: 5 VDC - 140 VDC continuously variable.
• Rep rate: DC to 3 MHZ.